Micro/Nanofabrication and MEMS¶
Track position¶
Deposition, lithography, etching, process integration, and MEMS design using process plans and simulation when cleanrooms are unavailable.
Recommended prerequisite tracks¶
Suggested order¶
Courses¶
| Course | Institution | Role | Tier | Practice coverage |
|---|---|---|---|---|
| Micro/Nano Processing Technology | MIT | Mainline | S | Complete |
| Design and Fabrication of Microelectromechanical Devices | MIT | Mainline | A | Complete |
| Micro and Nanofabrication (MEMS) | EPFL | Alternative | A | Partial |
| Basic Overview of Semiconductor Device Processing and IC Fabrication | IIT Kanpur / NPTEL | Supplement | A | Partial |
How to choose¶
- For a first systematic pass, start with audit-passed mainline courses; read the limitation before using a record marked “Audit review,” and rarely take parallel alternatives.
- Tiers measure public-resource completeness and self-study executability, not institutional or instructor prestige.
- Use supplements only to close a specific topic, tool, or practice gap.
Track completion¶
- Explain the core concepts, models, and methods of Micro/Nanofabrication and MEMS
- Produce reproducible exercises, experiments, or designs with explicit checks